Japan-based Shin Etsu has launched a new film former onto the North American market, aiming to give formulators greater resistance to oil and water in a variety of formulations and consumers enhanced sensorial qualities.
Called NBN-30-ID, the cosmetic silicone is a modified film forming material that was debuted at last month’s NYSCC Suppliers’ Day event, held in New Jersey and targeting formulation professionals.
The Shin Etsu development team says that the novel polymer was created following the introduction of a silicone group into a polynorbornene, which has a very rigid polymer structure.
Targeting skin and hair care as well as color cosmetics
The resulting ingredient is said to be one which can be used in a variety of color cosmetics, as well as skin and hair care formulations, diverse as foundations, eye shadows, mascaras, lipsticks, skin lotions, creams and sunscreens.
The ingredients properties include a tough film barrier, low tackiness that allows for a smooth feel when dry, flexibility even after application, great spinnability to give good adhesion for products such as mascara, and excellent oil repellency for a longer-lasting effect.
“Ultimately, this new generation of cosmetic NBN-30-ID silicone film formers produce a tough, long-lasting film that delivers optimal transfer,” said Shin Etsu North American marketing manager, Eric Bishop.
“This represents a unique solution for cosmetic formulators seeking diversity to meet the rapid demand of both mass and prestige consumers in the personal care market.”
Focus on sensorial attributes
At Suppliers’ Day the company demonstrated three formulations that had been put together using its latest film former, which included a mascara, a lipstick and a skin care cream, in an effort to platform the ingredients sensorial qualities.
In particular, the ingredient also focuses on the consumers’ increasing emphasis on sensorial attributes, with the bar for texture, skin feel and durability of skin care products and color cosmetics being constantly raised in recent years.